Strategies for hybrid techniques of UV lithography and thermal nanoimprint

Strategies for hybrid techniques of UV lithography and thermal nanoimprint

Author(s):

M. Wissen ( Univ. of Wuppertal, Germany )
N. Bogdanski ( Univ. of Wuppertal, Germany )
S. Moellenbeck ( Univ. of Wuppertal, Germany )
H.-C. Scheer ( Univ. of Wuppertal, Germany )

Publication title:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6792

Pub. Year:

2008

Page(from):

67920V-1

Page(to):

67920V-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

Language:

English

Call no.:

P63600/6792

Type:

Conference Proceedings

Details

TDL ID:	ZA00052423
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : EMLC
Conf. info. (Number):	2008 : 24th
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2008.01.21-2008.01.24
Note for article:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - NIL (6792-43)

Similar Items:

1 Conference Proceedings Challenges of residual layer minimisation in thermal nanoimprint lithography N. Bogdanski, M. Wissen, S. Moellenbeck, H. Scheer SPIE - The International Society of Optical Engineering	7 Conference Proceedings Mix and match of nanoimprint and UV lithography Reuther,F., Pfeiffer,K., Fink,M., Gruetzner,G., Schulz,H., Scheer,H.-C., Gaboriau,F., Cardinaud,C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Pattern-induced non-uniformity of residual layers in nanoimprint lithography Bogdanski, N., Wissen, M., Scheer, H.-C. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Nanoimprint lithography techniques: an introduction [6281-29] Scheer, -C. H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Dynamic mask defects in hot embossing lithography Bogdanski, N., Schulz, H., Wissen, M., Scheer, H. -C. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist Wissen, M., Glinsner, T., Bogdanski, N., Scheer, H.-C., Gruetzner, G. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Silanized polymeric working stamps for hot embossing lithography Wissen, M., Bogdanski, N., Jerzy, R., Berrada, Z.E., Fink, M., Reuther, F., Glinsner, T., Scheer, H.-C. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Mask definition by nanoimprint lithography Lyebyedyev,D., Scheer,H.-C. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Large-area definition of nanoelectrodes by nanoimprint lithography Wissen, M., Scheer, H.-C., Schulz, H., Horstmann, J. T., Scherff, M., Fahrner, W. R. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Nanostructuring of polymers by hot embossing lithography Scheer, H.-C., Glinsner, T., Wissen, M., Pelzer, R. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Low-temperature wafer-scale warm embossing for mix and match with UV lithography Schulz, H., Wissen, M., Roos, N., Scheer, H.-C., Pfeiffer, K., Gruetzner, G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Impact of vacuum environment on the hot embossing process Roos, N., Wissen, M., Glinsner, T., Scheer, H.-C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12