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Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

Author(s):
  • W. Häßler-Grohne ( Physikalisch-Technische Bundesanstolt, Germany )
  • C. G. Frase ( Physikalisch-Technische Bundesanstolt, Germany )
  • D. Gnieser ( Physikalisch-Technische Bundesanstolt, Germany )
  • H. Bosse ( Physikalisch-Technische Bundesanstolt, Germany )
  • J. Richter ( Advanced Mask Technology Ctr., Germany )
Publication title:
EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6792
Pub. Year:
2008
Page(from):
67920O-1
Page(to):
67920O-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819469564 [0819469564]
Language:
English
Call no.:
P63600/6792
Type:
Conference Proceedings

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