Key improvement schemes of accuracies in EB mask writing for double patterning lithography

Author(s):

• H. Sunaoshi ( NuFlare Technology, Inc., Japan )
• T. Kamikubo ( NuFlare Technology, Inc., Japan )
• R. Nishimura ( NuFlare Technology, Inc., Japan )
• K. Tsuruta ( NuFlare Technology, Inc., Japan )
• T. Katsumata ( NuFlare Technology, Inc., Japan )

Publication title:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6792

Pub. Year:

2008

Page(from):

679208-1

Page(to):

679208-7

Pages:

7

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

Language:

English

Call no.:

P63600/6792

Type:

Conference Proceedings