The effect of the OPC parameters on the performance of the OPC model

The effect of the OPC parameters on the performance of the OPC model

Author(s):

A. Abdo ( IBM Systems and Technology Group, USA )
A. Seoud ( Mentor Graphics Corp., USA )
A. Wei ( IBM Systems and Technology Group, USA )
I. Stobert ( IBM Systems and Technology Group, USA )
A. Leslie ( IBM Systems and Technology Group, USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

3

Page(from):

673055-1

Page(to):

673055-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Poster session: RET/OPC (6730-190)

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