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Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm

Author(s):
  • L. Pang ( Luminescent Technologies, Inc., USA )
  • Y. Liu ( Luminescent Technologies, Inc., USA )
  • T. Dam ( Luminescent Technologies, Inc., USA )
  • K. Mihic ( Luminescent Technologies, Inc., USA )
  • T. Cecil ( Luminescent Technologies, Inc., USA )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
3
Page(from):
673052-1
Page(to):
673052-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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