Blank Cover Image

Automatic residue removal for high-NA extreme illumination

Author(s):
  • J. Moon ( Hynix Semiconductor Inc., South Korea )
  • B.-S. Nam ( Hynix Semiconductor Inc., South Korea )
  • J.-H. Jeong ( Hynix Semiconductor Inc., South Korea )
  • D.-H. Kong ( Hynix Semiconductor Inc., South Korea )
  • B.-H. Nam ( Hynix Semiconductor Inc., South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
3
Page(from):
67304B-1
Page(to):
67304B-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Binary and attenuated PSM mask evaluation for sub 50nm device development perspective

J. Moon, B.-S. Nam, J.-H. Jeong, D.-H. Kong, B.-H. Nam

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Design and evaluation of automatic joining-assembly system of optical collimators with high efficiency

Choi, D.S., Je, T.J., Hwang, K.H., Moon, J.H.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings DFM application on dual tone sub 50nm device

B.-S. Nam, J. Moon, J.-H. Jeong, D.-H. Kong, S. Oh

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Wafer scale error induced by bottom antireflective coating

Kim,D.-S., Jeong,J.-H., Nam,B.-H., Hwang,Y.J., Song,Y.J.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination

H. Yune, Y. Ahn, D. Lee, J. Moon, B. Nam, D. Yim

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Simple method to verify OPC data based on exposure condition [6156-40]

Moon, J., Ahn, Y.-B., Oh, S.-Y, Nam, B.-H, Yim, D. G.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Self-assembled dummy patterns for lithography process margin enhancement

J. Moon, B. Nam, J. Jeong, D. G. Yim

SPIE - The International Society of Optical Engineering
10 Conference Proceedings High-power source and illumination system for extreme ultraviolet lithography

Kubiak,G.D., Bernardez,L.J., Krenz,K D., Replogle,W.C., Sweatt,W.C., Sweeney,D.W., Hudyma,R.M., Shields,H.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Lithography process margin enhancement using illumination based assist pattern [6283-68]

Moon, J., Lee, -J. D., Sim, -H. G., Eum, -D. J., Nam, -H. B., Yim, G. D.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Organic thin-film transistor arrays for active-matrix organic light emitting diode

S. Lee, H. Moon, D. H. Kim, B.-W. Koo, E.-J. Jeong

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings The study of contact hole for 65nm node with KrF [6283-77]

You, -J. T., Ko, -W. S., Moon, J., Ahn, -B. Y., Nam, -H. B., Yim, -G. D.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Patterning 220-nm pitch DRAM patterns by using double mask exposure

Nam,D., Seong,N., Cho,H., Moon,J., Lee,S.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12