Coping with double-patterning/exposure lithography by EB mask writer EBM-6000
- Author(s):
- T. Kamikubo ( NuFlare Technology, Inc., Japan )
- R. Nishimura ( NuFlare Technology, Inc., Japan )
- K. Tsuruta ( NuFlare Technology, Inc., Japan )
- K. Hattori ( NuFlare Technology, Inc., Japan )
- J. Takamatsu ( NuFlare Technology, Inc., Japan )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 2
- Page(from):
- 673031-1
- Page(to):
- 673031-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
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