Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Author(s):

• T. Kamikubo ( NuFlare Technology, Inc., Japan )
• R. Nishimura ( NuFlare Technology, Inc., Japan )
• K. Tsuruta ( NuFlare Technology, Inc., Japan )
• K. Hattori ( NuFlare Technology, Inc., Japan )
• J. Takamatsu ( NuFlare Technology, Inc., Japan )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

2

Page(from):

673031-1

Page(to):

673031-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings