Correction technique of EBM-6000 prepared for EUV mask writing

Correction technique of EBM-6000 prepared for EUV mask writing

Author(s):

S. Yoshitake ( NuFlare Technology Inc., Japan )
H. Sunaoshi ( NuFlare Technology Inc., Japan )
J. Yashima ( NuFlare Technology Inc., Japan )
S. Tamamushi ( NuFlare Technology Inc., Japan )
M. Ogasawara ( Toshiba Corp., Japan )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

2

Page(from):

673030-1

Page(to):

673030-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 20. Patterning (6730-105)

Similar Items:

1 Conference Proceedings Modeling of charging effect and its correction by EB mask writer EBM-6000 N. Nakayamada, S. Wake, T. Kamikubo, H. Sunaoshi, S. Tamamushi Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Stage tracking of a mask-scan EB mask writer test stand Nishimura,S., Mitsui,S., Ogasawara,M., Akeno,K., Shimizu,M., Kusakabe,H., Wada,H., Hattori,K., Yoshitake,S., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Study of heating effect on CAR in electron-beam mask writing T. Kamikubo, M. Hiramoto, J. Yashima, M. Takahashi, R. Nishimura, T. Katsumata, H. Anze, H. Sunaoshi, S. Tamamushi, M. … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Eddy current evalution for a high-resolution EB system Shimomura,N., Ogasawara,M., Hattori,K., Takamastsu,J., Sunaoshi,H., Yoshitake,S., Fukudome,Y., Akeno,K. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Writing accuracy of EBM-3500 electron-beam mask writing system Ohtoshi,K., Sunaoshi,H., Takamatsu,J., Okabe,F., Ishibashi,K., Yoshitake,S., Yamada,H., Tamamushi,S., Anze,H., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optical column of the mask-scan EB mask writer test stand Shimomura,N., Ogasawara,M., Takamatsu,J., Sunaoshi,H., Hattori,K., Yoshiake,S., Fukudome,Y., Akeno,K. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Electron-beam mask writer EBM-6000 for 45 nm HP node J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Advanced electron-beam writing system EX-11 for next-generation mask fabrication Tojo, T., Yoshikawa, R., Ogawa, Y., Tamamushi, S., Hattori, Y., Koikari, S., Kusakabe, H., Abe, T., Ogasawara, M., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Desired IP control methodology for EUV mask in current mask process S. Yoshitake, H. Sunooshi, S. Tomamushi, M. Ogasawara Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam Yoshitake,S., Ogawa,Y., Sakurai,H., Itoh,M., Higashikawa,I., Nakayamada,N., Matsuki,K., Tamamushi,S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings EBM-5000: electron-beam mask writer for 45 nm node [6283-04] Sunaoshi, H., Tachikawa, Y., Higurashi, H., Iijima, T., Suzuki, J., Kamikubo, T., Ohtoshi, K., Anze, H., Katsumata, T., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Reticle flexure influence on pattern positioning accuracy for reticle writing R. Hirano, K. Matsuki, S. Yoshitake, Y. Takahashi, S. Tamamushi Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12