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The study of CD error in mid-local pattern area caused by develop loading effect

Author(s):
  • M.-K. Kang ( Samsung Electronics, Co. Ltd., South Korea )
  • J.-H. Lee ( Samsung Electronics, Co. Ltd., South Korea )
  • S.-Y. Kim ( Samsung Electronics, Co. Ltd., South Korea )
  • B.-G. Kim ( Samsung Electronics, Co. Ltd., South Korea )
  • S.-G. Woo ( Samsung Electronics, Co. Ltd., South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
1
Page(from):
67300H-1
Page(to):
67300H-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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