Blank Cover Image

Resolution enhancement technology for ArF dry lithography at 65 nm node

Author(s):
  • S. Goo ( Institute of Electrical Engineering, China )
  • Y. Li ( Institute of Electrical Engineering, China )
Publication title:
Design, manufacturing, and testing of micro- and nano-optical devices and systems : 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies : 8-12 July 2007, Chengdu, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6724
Pub. Year:
2007
Page(from):
67240Z-1
Page(to):
67240Z-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468819 [0819468819]
Language:
English
Call no.:
P63600/6724
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Resolution enhancement technology requirements for 65-nm node

Kroyan, A., Liu, H.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Progressive ArF exposure tool for 65nm node lithography

Nobuyuki Irie, Masato Hamatani, Masahiro Nei

SPIE - The International Society of Optical Engineering
2 Conference Proceedings BEOL lithography for early development at the 65-nm node

DellaGuardia, R., Kwong, R.W., Li, W., Lawson, P., Burkhardt, M., Grauer, I.C., Wu, Q., Angyal, M., Hichri, H., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Extending ArF to the 65-nm node with full-phase lithography

Driessen, F.A., Pierrat, C., Vandenberghe, G., Ronse, K.G., Adrichem, P., Liu, H.-Y.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)

Akima, S., Komizo, T., Kawakita, S., Kodera, Y., Narita, T., Ishikawa, K.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development

X. Miao, X. Xu, Y. Chen, C. Ordonio, C. Bencher, C. Ngai

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Status of ArF lithography for the 130-nm technology node

Ronse,K., Vandenberghe,G., Jaenen,P., Delvaux,C., Vangoidsenhoven,D., Roey,F.Van, Pollers,I., Maenhoudt,M., …

SPIE - The International Society for Optical Engineering
10 Conference Proceedings ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Double dipole lithography for 65-nm node and beyond: a technology readiness review

Hsu, S.D., Eurlings, M., Hendrickx, E., Van Den Broeke, D.J., Chiou, T.-B., Chen, J.F., Laidig, T.L., Shi, X., Finders, …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]

Yoon, G.-S., Kim, S.-H., Park, J.-S., Choi, S.-Y., Jean, C.-U., Shin, I.-K., Choi, S.-W., Han, W.-S.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings A 65-nm node SRAM solution using alt-PSM with ArF lithography

Driessen, F.A., Zawadzki, M.T., Krishnan, P.R., Balasinski, A., Vandenberghe, G.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Taking the X Architecture to the 65-nm technology node

Sarma, R.C., Smayling, M.C., Arora, N., Nagata, T., Duane, M.P., Shah, S., Keston, H.J., Oemardani, S.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12