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Simulation for effect of process parameters on surface profile in thick film photolithography

Author(s):
  • X. Tang ( Univ. of Electronic Science and Technology of China, China )
  • H. Li ( Univ. of Electronic Science and Technology of China, China )
  • J. Liao ( Univ. of Electronic Science and Technology of China, China )
  • Y. Liu ( Univ. of Electronic Science and Technology of China, China )
  • Y. Guo ( Sichuan Univ., China )
Publication title:
Design, manufacturing, and testing of micro- and nano-optical devices and systems : 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies : 8-12 July 2007, Chengdu, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6724
Pub. Year:
2007
Page(from):
67240T-1
Page(to):
67240T-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468819 [0819468819]
Language:
English
Call no.:
P63600/6724
Type:
Conference Proceedings

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