Process optimization of DLC films by unbalanced magnetron sputtering for laser-induced damage threshold improvement

Process optimization of DLC films by unbalanced magnetron sputtering for laser-induced damage threshold improvement

Author(s):

J. Xu ( Xi'an Institute of Technology, China )
J. Su ( Xi'an Institute of Technology, China )
W. Liu ( Xi'an Institute of Technology, China )
H. Fan ( Northwestern Polytechnical Univ., China )
S. Xie ( Northwestern Polytechnical Univ., China )

Publication title:

Advanced optical manufacturing technologies

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6722

Pub. Year:

2007

Vol.:

1

Page(from):

67220A-1

Page(to):

67220A-6

Pages:

6

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468796 [0819468797]

Language:

English

Call no.:

P63600/6722

Type:

Conference Proceedings

Details

TDL ID:	ZA00052368
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Advanced Optical Manufacturing and Testing Technologies
Conf. info. (Number):	2007 : 3rd
Conf. info. (Venue):	Chengdu, China
Conf. info. (Date):	2007.07.08-2007.07.12
Note for article:	3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 8-12 July 2007, Chengdu, China - Session 2-1 (6722-09)

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