A New Method of Manufacturing High Aspect Ratio Structures Using SU8 Negative Photoresist

A New Method of Manufacturing High Aspect Ratio Structures Using SU8 Negative Photoresist

Author(s):

Publication title:

Integrated miniaturized materials--from self-assembly to device integration : symposium held April 5-9, 2010, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1272

Pub. Year:

2010

Page(from):

63

Page(to):

68

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605112497 [1605112496]

Language:

English

Call no.:

M23500/1272

Type:

Conference Proceedings

Details

TDL ID:	ZA00050346
Series ID:	PA00000011
Conf. info. (Name):	MRS Spring Meeting : Symposium KK : Symposium LL : Symposium NN : Symposium OO
Conf. info. (Number):	2010
Conf. info. (Venue):	San Francisco, California, USA
Conf. info. (Date):	2010.04.05-2010.04.09

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