Low Temperature Dopant Activation Using Variable Frequency Microwave Annealing

Low Temperature Dopant Activation Using Variable Frequency Microwave Annealing

Author(s):

T.L. Alford

Publication title:

Amorphous and polycrystalline thin-film silicon science and technology--2010 : symposium held April 5-9, 2010, San Francisco, California

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1245

Pub. Year:

2010

Page(from):

331

Page(to):

336

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605112220 [1605112224]

Language:

English

Call no.:

M23500/1245

Type:

Conference Proceedings

Details

TDL ID:	ZA00050334
Series ID:	PA00000011
Conf. info. (Name):	MRS Spring Meeting : Symposium A
Conf. info. (Number):	2010
Conf. info. (Venue):	San Francisco, California, USA
Conf. info. (Date):	2010.04.05-2010.04.09

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