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Uniformity and Quality of Monocrystalline Silicon Passivation by Thin Intrinsic Amorphous Silicon in a New Generation Plasma-Enhanced Chemical Vapor Deposition Reactor

Author(s):
B. Strahm
Y. Andrault
D. Bäetzner
D. Lachenal
C. Guérin
M. Kobas
J. Mai
B. Mendes
T. Schulze
G. Wahli
A. Buechel
6 more
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2010 : symposium held April 5-9, 2010, San Francisco, California
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1245
Pub. Year:
2010
Page(from):
31
Page(to):
38
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605112220 [1605112224]
Language:
English
Call no.:
M23500/1245
Type:
Conference Proceedings

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