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Atomic Layer Deposition of Ruthenium Films on Hydrogen terminated Silicon

Author(s):
Sun Kyung Park
K. Roodenko
Yves J. Chabal
L. Wielunski
R. Kanjolia
J. Anthis
R. Odedra
N. Boag
3 more
Publication title:
Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2009 : symposium held April 14-17, 2009, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1156
Pub. Year:
2009
Page(from):
73
Page(to):
78
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605111292 [1605111295]
Language:
English
Call no.:
M23500/1156
Type:
Conference Proceedings

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