Role of Boron TED and Series Resistance in SiGe/Si Heterojunction pMOSFETs
- Author(s):
Yonghyun Kim Chang Yong Kang Se-Hoon Lee Prashant Majhi Byoung-Gi Min Ki-Seung Lee Donghwan Ahn Sanjay K. Banerjee - Publication title:
- CMOS gate-stack scaling--materials, interfaces and reliability implications : symposium held April 14-16, 2009, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 1155
- Pub. Year:
- 2009
- Page(from):
- 91
- Page(to):
- 96
- Pages:
- 6
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605111285 [1605111287]
- Language:
- English
- Call no.:
- M23500/1155
- Type:
- Conference Proceedings
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