TiAlN Films Deposited by AC Reactive Magnetron Sputtering

TiAlN Films Deposited by AC Reactive Magnetron Sputtering

Author(s):

G.C. Vandross ( University of Arkansas, Fayetteville, AR )
H.H. Abu-Safe ( University of Arkansas, Fayetteville, AR )
K. Abu-Shgair ( AI-Balqa University, Salt, Jordan )
M.H. Gordon ( University of Arkansas, Fayetteville, AR )

Publication title:

51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL

Title of ser.:

Annual Technical Conference of Society of Vacuum Coaters

Ser. no.:

51

Pub. Year:

2008

Page(from):

635

Page(to):

638

Pages:

4

Pub. info.:

Albuquerque, NM: Society of Vacuum Coaters

ISSN:

07375921

Language:

English

Call no.:

A63930/51

Type:

Conference Proceedings

Details

TDL ID:	ZA00049388
Series ID:	PA00000013
Conf. info. (Name):	Society of Vacuum Coaters. Annual technical conference
Conf. info. (Number):	2008 : 51th
Conf. info. (Venue):	Chicagom, IL, USA
Conf. info. (Date):	2008.04.19-2008.04.24

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