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Plasma Enhanced CVD and Plasma Chemical Etching at Atmospheric Pressure for Continuous Processing of Crystalline Silicon Solar Wafers

Author(s):
E. Lopez ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
B. Dresler ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
G. Mäder ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
I. Dani ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
V. Hopfe ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
S. Kaskel ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
M. Heintze ( Centrotherm Photovoltaics GmbH & Co. KG, Blaubeuren, Germany )
R. Möller ( Centrotherm Photovoltaics GmbH & Co. KG, Blaubeuren, Germany )
H. Wanka ( Centrotherm Photovoltaics GmbH & Co. KG, Blaubeuren, Germany )
M. Kirschmann ( Q-Cells AG, Thalheim, Germany; )
J. Frenck ( Q-Cells AG, Thalheim, Germany; )
A. Poruba ( Solartec s.r.o., Roznov pod Radhostem, Germany )
R. Barinka ( Solartec s.r.o., Roznov pod Radhostem, Germany )
R. Dahl ( Centrotherm Photovoltaics Technology GmbH, Konstanz, Germany )
H. Nussbaumer ( Centrotherm Photovoltaics Technology GmbH, Konstanz, Germany )
10 more
Publication title:
51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
51
Pub. Year:
2008
Page(from):
622
Page(to):
626
Pages:
5
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/51
Type:
Conference Proceedings

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