Blank Cover Image

Heat Sterilizable Gas Barrier Film Deposited on Polyamide by Plasma-Enhanced CVD

Author(s):
  • D. Chiba ( Dai Nippon Printing Co. Ltd., Tokoyo, Japan )
  • K. Mikami ( Dai Nippon Printing Co. Ltd., Tokoyo, Japan )
  • H. Sakamoto ( Dai Nippon Printing Co. Ltd., Tokoyo, Japan )
  • H. Tsuchiya ( Dai Nippon Printing Co. Ltd., Tokoyo, Japan )
Publication title:
49th annual technical conference proceedings, April 22-27, 2006, Washington, D.C.
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
49
Pub. Year:
2006
Page(from):
613
Page(to):
616
Pages:
4
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/49
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Gas Barrier Silica Films Deposited on Polyethyleneterephtalate by Low-Temperature Plasma-Enhanced CVD Using Organosilane Sources

K. Teshima, Y. lnoue, H. Sugimura, O. Takai

Society of Vacuum Coaters
7 Conference Proceedings Using Electron Cyclotron Resonance Plasma for Depositing Epitaxial Titanium Nitride Thin Films

Murzin, I. H., Hayashi, N., Sakamoto, I.

MRS - Materials Research Society
2 Conference Proceedings Characteristics of Organic Film Deposited by Plasma-Enhanced CVD Using BCB Resin

Sugitani, S., Matsuzaki, H., Enoki, T.

Electrochemical Society
8 Conference Proceedings Plasma-Enhanced CVD Deposited Diamond-Like Carbon Films for High-Density Magnetic Recording

D. Ochs, M. Geisler, B. Cord

Society of Vacuum Coaters
3 Conference Proceedings Optical and thermomechanical properties of plasma-enhanced CVD silicon dioxide films upon annealing

Choi, D.Y., You, K.H., Guessel, S., Jung, S.T.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings XPS, Impedance and Photo-Electrochemical Characterisation of Passive Films on Ni and Ni-18Cr in Sulphuric Acid Solution

Fujimoto, S., Tsuchiya, H., Sakamoto, M., Shibata, T., Asami, K.

Electrochemical Society
4 Conference Proceedings PROPERTIES OF DOPED a-Si:H FILMS DEPOSITED BY ECR PLASMA CVD

Murai, H., Hayama, M., Kobayashi, K., Yamazaki, T.

Materials Research Society
10 Conference Proceedings Characterization of BN Thin Films Deposited by Plasma CVD

Osaka,Y., Chayahara,A., Yokoyama,H., Okamoto,M., Hamada,T., Imura,T., Fujisawa,M.

Trans Tech Publications
5 Conference Proceedings Atmospheric Plasma Treatment of Polyamide Films

D. Pappas, A. Bujanda, J.D. Demaree, J.K. Hirvonen, W. Kosik, R. Jensen., S. McKnight

Society of Vacuum Coaters
11 Conference Proceedings Thin-Film Transistors of Microcrystalline Silicon Deposited by Plasma Enhanced CVD

Wagner, Y. ChenS.

Materials Research Society
6 Conference Proceedings Development of plasma-enhanced CVD for multilayer mirror coatings

C.B. Freidhoff, H. Buhay, W.D. Partlow, D.L. Decker, K.A. Klemm

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Advanced CVD Silicon Carbide Barrier Technology for Protection from Detrimental Gases

L. Zambov, K. Weidner, V. Shamamian, R. Camilletti, U. Pernisz, S. Snow, M. Loboda, D. Gidley, H-G. Peng, R. Vallery

Society of Vacuum Coaters
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12