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Radio Frequency Impedance Analysis of Silane Plasma for the Growth of Nanocrystalline Silicon Thin Films

Author(s):
P.N. Dixit ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
S. Kumar ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
C.M.S. Rauthan ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
M. Dilshad ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
A. Bhardwaj ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
S.S.Rajput ( Plasma Processed Materials Group, National Physical Laboratory, New Delhi, India )
1 more
Publication title:
49th annual technical conference proceedings, April 22-27, 2006, Washington, D.C.
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
49
Pub. Year:
2006
Page(from):
441
Page(to):
446
Pages:
6
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/49
Type:
Conference Proceedings

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