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Industrial Implementation of Plasma Deposition Using the Expanding Thermal Plasma Technique

Author(s):
M.C.M. van de Sanden ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
P.J. van den Oever ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
M. Creatore ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
M. Schaepkens ( General Electric Global Research Center, Schenectady, New York )
T. Miebach ( General Electric Global Research Center, Schenectady, New York )
C.D. Iacovangelo ( General Electric Global Research Center, Schenectady, New York )
R.C.M. Bosch ( OTB Engineering B.V., Eindhoven, The Netherlands )
M. Bijker ( OTB Engineering B.V., Eindhoven, The Netherlands )
M. Evers ( OTB Engineering B.V., Eindhoven, The Netherlands )
D.C. Schram ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
W.M.M. Kessels ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
6 more
Publication title:
47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
47
Pub. Year:
2004
Page(from):
447
Page(to):
454
Pages:
8
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/47
Type:
Conference Proceedings

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