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Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Author(s):
  • T. Roschuk ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
  • J. Wojcik ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
  • R Mascher ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
Publication title:
47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
47
Pub. Year:
2004
Page(from):
362
Page(to):
367
Pages:
6
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/47
Type:
Conference Proceedings

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