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In-situ Spectroscopic Ellipsometry and Plasma Control for Large-Scale Magnetron Sputter Deposition Processes

Author(s):
M. Vergöhl ( Fraunhofer Institute for Surface Engineering and Thin Films, Germany )
N. Malkomes ( Fraunhofer Institute for Surface Engineering and Thin Films, Germany )
T. Matthée ( Fraunhofer Institute for Surface Engineering and Thin Films, Germany )
G. Bräuer ( Fraunhofer Institute for Surface Engineering and Thin Films, Germany )
U. Richter ( Sentech Instruments GmbH, Germany )
F.-W. Nickolc ( Semco Glasbeschichtung GmbH, Germany )
J. Bruch ( Balzers Process Systems, Germany )
2 more
Publication title:
43rd Annual Technical Conference proceedings, April 15-20, 2000, Denver, Colorado
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
43
Pub. Year:
2000
Page(from):
11
Page(to):
16
Pages:
6
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/43
Type:
Conference Proceedings

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