Impact of the High-Temperature Process Steps on the HfAlO Interpoly Dielectric Stacks for Nonvolatile Memory Applications

Impact of the High-Temperature Process Steps on the HfAlO Interpoly Dielectric Stacks for Nonvolatile Memory Applications

Author(s):

Publication title:

Materials science and technology for nonvolatile memories : symposium held March 24-27, 2008, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1071

Pub. Year:

2008

Page(from):

23

Page(to):

28

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605110417 [1605110418]

Language:

English

Call no.:

M23500/1071

Type:

Conference Proceedings

Details

TDL ID:	ZA00049374
Series ID:	PA00000011
Conf. info. (Name):	Materials Research Society Meeting ; Symposium on Materials Science and Technology for Nonvolatile memories
Conf. info. (Number):	2008
Conf. info. (Venue):	San Francisco, California, U.S.A.
Conf. info. (Date):	2008.05.24-2008.05.27

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