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Effect of Elevated Implant Temperature on Amorphization and Activation in As-implanted Silicon-on-insulator Layers

Author(s):
Katherine L. Saenger
Stephen W. Bedell
Matthew Copel
Amlan Majumdar
John A. Ott
Joel P. de Souza
Steven J. Koester
Donald R. Wall
Devendra K. Sadana
4 more
Publication title:
Doping engineering for front-end processing : symposium held March 25-27, 2008, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1070
Pub. Year:
2008
Page(from):
205
Page(to):
210
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605110400 [160511040X]
Language:
English
Call no.:
M23500/1070
Type:
Conference Proceedings

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