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Performance Characteristics of 65nm PFETs Using Molecular Implant Species for Source and Drain Extensions

Author(s):
C. F. Tan
L. W. Teo
C-S. Yin
J. G. Lee
J. Liu
A. See
M. S. Zhou
E. Quek
S. Chu
C. Hatem
N. Variam
E. Arevalo
A. Gupta
S. Mehta
9 more
Publication title:
Doping engineering for front-end processing : symposium held March 25-27, 2008, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1070
Pub. Year:
2008
Page(from):
99
Page(to):
104
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605110400 [160511040X]
Language:
English
Call no.:
M23500/1070
Type:
Conference Proceedings

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