Quality and Growth Rate of Hot-wire Chemical Vapor Deposition Epitaxial Si Layers

Quality and Growth Rate of Hot-wire Chemical Vapor Deposition Epitaxial Si Layers

Author(s):

Charles W Teplin

Publication title:

Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1066

Pub. Year:

2008

Page(from):

285

Page(to):

292

Pages:

8

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605110363 [1605110361]

Language:

English

Call no.:

M23500/1066

Type:

Conference Proceedings

Details

TDL ID:	ZA00049370
Series ID:	PA00000011
Conf. info. (Name):	Materials Research Society meeting ; Symposium on amorphous and polycrystalline thin-film silicon science and technology
Conf. info. (Number):	2008
Conf. info. (Venue):	San Francisco, California, U.S.A.
Conf. info. (Date):	2008.05.25-2008.05.28

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