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Plasma Etching Technology for Low-k Porous SiOCH Films

Author(s):
M. Hori  
Publication title:
Silicon nitride, silicon dioxide, and emerging dielectrics 9
Title of ser.:
ECS transactions
Ser. no.:
6(3)
Pub. Year:
2007
Page(from):
485
Page(to):
500
Pages:
16
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775526 [1566775523]
Language:
English
Call no.:
E23400/6-3
Type:
Conference Proceedings

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