NBTI Mechanism Based on Hole-Injection for Accurate Lifetime Prediction

NBTI Mechanism Based on Hole-Injection for Accurate Lifetime Prediction

Author(s):

Publication title:

Silicon nitride, silicon dioxide, and emerging dielectrics 9

Title of ser.:

ECS transactions

Ser. no.:

6(3)

Pub. Year:

2007

Page(from):

229

Page(to):

244

Pages:

16

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775526 [1566775523]

Language:

English

Call no.:

E23400/6-3

Type:

Conference Proceedings

Details

TDL ID:	ZA00047127
Series ID:	PA00000034
Conf. info. (Name):	Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics ; Meeting of The Electrochemical Society
Conf. info. (Number):	9th ; 211th
Conf. info. (Venue):	Chicago, IL, USA
Conf. info. (Date):	2007.05.06-2007.05.11

Similar Items:

1 Conference Proceedings New NBTI Lifetime Prediction Method for Ultra Thin SiO₂ Film K. Watanabe, R. Kuroda, A. Teramoto, S. Sugawa, T. Ohmi Electrochemical Society	7 Conference Proceedings (228ee) Accurate Structure Prediction of CDR H3 Loops Enabled By a Structure-Based C-Terminal Constraint within Rosetta Brian D. Weitzner, Nick Marze, Sergey Lyskov, Jeliazko R. Jeliazkov, Daisuke Kuroda American Institute of Chemical Engineers
2 Conference Proceedings Hot Carrier Instability Mechanism in Accumulation-Mode Normally-off SOI nMOSFETs and Their Reliability Advantage R. Kuroda, A. Teramoto, W. Cheng, S. Sugawa, T. Ohmi Electrochemical Society	8 Conference Proceedings SUPRESSION OF SURFACE MICRO-ROUGHNESS OF SILICON WAFER BY ADDITION OF ALCOHOL INTO ULTRA PURE WATER FOR RINSING PROCESS M. Yamamoto, K. Nii, H. Morinaga, A. Teramoto, T. Ohmi Electrochemical Society
3 Conference Proceedings Hole Mobility in Si(110) p-MOS Transistors P. Gaubert, A. Teramoto, T. Ohmi Electrochemical Society	9 Conference Proceedings Suppression of Surface Micro-Roughness on Si(110) Nii, K., Akahori, H., Yamamoto, M., Teramoto, A., Ohmi, T. Electrochemical Society
4 Conference Proceedings Performance Boost Using a New Device Structure Design for SOI MOSFETs Beyond 25nm Node W. Cheng, A. Teramoto, T. Ohmi Electrochemical Society	10 Conference Proceedings High Reliability of Ultraclean Oxide Films M. Morita, K. Nakamura, A. Teramoto, K. Makihara, T. Ohmi Electrochemical Society
5 Conference Proceedings Microcrystalline Si1-xGex Deposited by Magnetron Sputtering A. Hiroe, T. Goto, A. Teramoto, T. Ohmi Electrochemical Society	11 Conference Proceedings Contribution of As-grown Hole Traps to NBTI M. H. Chang, Y. Wang, J. F. Zhang, C. Zhao, W. Zhang, M. Xu Electrochemical Society
6 Conference Proceedings THE EFFECT OF OXYGEN CONCENTRATION IN CLEANING PROCESS ON SILICON SURFACE N. Mizutani, H. Morinaga, A. Teramoto, T. Ohmi Electrochemical Society	12 Conference Proceedings Accurate TDDB Lifetime Prediction of High-k Stacked Gate Dielectrics with Regarding High Density Initial Traps K. Okada, H. Ota, T. Nabatame, A. Toriumi Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12