Blank Cover Image

Bias Temperature Instability Characterization of Advanced Gate Stacks

Author(s):
S. Fujieda
M. Terai
M. Saitoh
A. Toda
Y. Miura
Z. Liu
Y. Teracka
A. Yoshigoe
M. Wilde
K. Fukutani
5 more
Publication title:
Silicon nitride, silicon dioxide, and emerging dielectrics 9
Title of ser.:
ECS transactions
Ser. no.:
6(3)
Pub. Year:
2007
Page(from):
185
Page(to):
202
Pages:
18
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775526 [1566775523]
Language:
English
Call no.:
E23400/6-3
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Advanced Gate Stacks with Fully Silicided Gates and High-k Dielectrics for Low Power CMOS

T. Ogura, M. Saitoh, K. Takahashi, K. Manabe, A. Toda, M. Terai, K. Watanabe, K. Masuzaki, T. Iwamoto, T. Hase, T. …

Electrochemical Society
7 Conference Proceedings Transient Photocurrent Spectroscopy of Trap Levels in Ultra-Thin SiO2 Films

Miura, Y., Fujieda, S.

MRS - Materials Research Society
2 Conference Proceedings Low Power and High Speed Hf-based Gated CMOS FET with Dual Poly-Si Gate Electrodes (Invited paper)

Iwamoto, T., Ogura, T., Terai, M., Morioka, A., Saitoh, M., Kimizuka, N., Yasuda, Y., Imai, K., Fujieda, S., Watanabe, …

Electrochemical Society
8 Conference Proceedings Control of Material Interactions in Advanced High-k Metal Gate Stacks

C. Wajda, G. Leusink, K. Akiyama, S. Ashigaki, S. Aoyama, K. Shimomura, M. Aruga, T. Takahashi, K. Yamazaki, H. Yamasaki

Electrochemical Society
3 Conference Proceedings Stability of Advanced Gate Stack Devices

Kim, I., Han, S.K., Osburn, G.M.

Electrochemical Society
9 Conference Proceedings 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices

Gutt, J., Gopalan, S., Brown, G. A., Kirsch, P. D., Peterson, J. J., Gardner, M., Li, H.-J., Lysaght, P., Alshareef, H. …

Electrochemical Society
4 Conference Proceedings Hydrogen Model for Negative Bias Temperature Instabilities in MOS Gate Dielectrics

Fleetwood, D.M., Zhou, X.J., Tsetseris, L., Pantelides, S.T., Schrimpf, R.D.

Electrochemical Society
10 Conference Proceedings Integration Issues with High k Gate Stacks*

Osburn, C.M., Han, S.K., Kim, I., Campbell, S.A., Garfunkel, E., Gustafson, T., Hauser, J., King, T.-J., Liu, Q., …

Electrochemical Society
5 Conference Proceedings Dynamic Characterization of the Threshold Voltage Instability under the Pulsed Gate Bias Stress in 4H-SiC MOSFET

M. Okamoto, M. Sometani, S. Harada, H. Yano, H. Okumura

Trans Tech Publications
11 Conference Proceedings Advanced Metal Gate FinFET CMOS TEchnology

Y. Liu, T. Matsukawa, K. Endo, M. Masahara, S. Ouchi

Electrochemical Society
6 Conference Proceedings Paramagnetic defects related to positive charges in silicon oxynitride films

Miura, Y., Fujieda, S., Hasegawa, E.

MRS-Materials Research Society
12 Conference Proceedings Combinatorial Methodology for the Exploration of Metal Gate Electrodes on HfO2 for the Advanced Gate Stack

K. Chang, M. Green, J.S. Suehle, J. Hattrick-Simpers, I. Takeuchi

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12