Experimental Study of the Impact of SO Phonon Scattering in High-K Gate Dielectric MOSFETs

Experimental Study of the Impact of SO Phonon Scattering in High-K Gate Dielectric MOSFETs

Author(s):

S. Atorah

Publication title:

Physics and technology of high-k gate dielectrics 4

Title of ser.:

ECS transactions

Ser. no.:

3(3)

Pub. Year:

2006

Page(from):

49

Page(to):

58

Pages:

10

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775038 [1566775035]

Language:

English

Call no.:

E23400/3-3

Type:

Conference Proceedings

Details

TDL ID:	ZA00047111
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on High Dielectric Constant Gate Stacks ; Meeting of the Electrochemical Society
Conf. info. (Number):	4th ; 210th
Conf. info. (Venue):	Cancun, Mexico
Conf. info. (Date):	2006.10.30-2006.11.03

Similar Items:

1 Conference Proceedings Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface Barnett, Joel, Moumen, N., Gutt, J., Gardner, M., Huffman, C., Majhi, P., Peterson, J.J., Gopalan, S., Foran, B., Li, … Materials Research Society	7 Conference Proceedings Elfect of Deposition Sequence and Plasma Treatment on ALCVD HfO₂ n-MOSFET Properties C. Lim, Y. Kim, A. Hou, J. Gutt, S. Marcus, C. Pomarede, E. Shero, H. de Waard, C. Werkhoven, L. Chen, J. Tamim, N. … Electrochemical Society
2 Conference Proceedings Development of Silicon Nitride Films for Gate Dielectric Applications Brady, D., Watt, V.H.C., Karamcheti, A., Vishnubhotla, L., Bersuker, G., Kim, S., Zietzoff, P., Gilmer, M., Guan, J., … Electrochemical Society	8 Conference Proceedings Process and Manufacturing Challenges for High-K Gate Stack Systems Gilmer, M. C., Luo, T-Y., Huff, H. R., Jackson, M. D., Kim, S., Bersuker, G., Zeitzoff, P., Vishnubhotla, L., Brown, G. … MRS - Materials Research Society
3 Conference Proceedings Breakdown Characteristics of High-k Gate Dielectrics with Metal Gates D. Misra, N. Chowdhury, G. Bersuker, C. Young, R. Choi Electrochemical Society	9 Conference Proceedings Alternate Gate Oxides for Silicon MOSFETs Using High-K Dielectrics Billman, C. A., Tan, P. H., Hubbard, K. J., Schlom, D. G. MRS - Materials Research Society
4 Conference Proceedings SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE Peterson, J., Barnett, J., Young, C., Hou, A., Gutt, J., Gopalan, S., Lee, C.H., Li, H.J., Moumen, N., Chaudhary, N., … Electrochemical Society	10 Conference Proceedings High and Low Stress Voltage Instabilities in High-K Gate Stacks G. Bersuker, C. Young, D. Heh, R. Choi, B. Lee Electrochemical Society
5 Conference Proceedings Electrical Characterization Methodologies for the Assessment of High-κ Gate Dielectric Stacks C.D. Young, G. Bersuker, D. Heh, A. Neugroschel, R. Choi Electrochemical Society	11 Conference Proceedings Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. … MRS-Materials Research Society
6 Conference Proceedings Transient Charging Effects and Its Implications to The Reliablility of High-k Dielectrics Lee, B. H, Choi, R, Harris, R, Krishan, S. A, Young, C. D, Sim, J., Bersuker, G Springer	12 Conference Proceedings Ga2O3(Gd2O3) as a Gate Dielectric for GaAs MOSFETs Hong, M., Kwo, J., Liu, C.T., Marcus, M.A., Lay, T.S., Ren, F., Mannaerts, J.P., Ng, K.K., Chen, Y.K., Chou, L.J., … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12