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Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing

Author(s):
S. B. Felch
A. Falepin
S. Seven
E. Augendre
T. Noda
V. Parihar
F. Nouri
T. Hoffinann
B. Pawlak
P. Eyben
W. Vandervorst
S. Thirupapuliyur
R. Schreuelkamp
E. Collart
H. Graoui
10 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
Title of ser.:
ECS transactions
Ser. no.:
3(2)
Pub. Year:
2006
Page(from):
105
Page(to):
112
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775021 [1566775027]
Language:
English
Call no.:
E23400/3-2
Type:
Conference Proceedings

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