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Crystal Damage Removal by Spike and Flash Annealing

Author(s):
W. Lerch
S. Paul
J. Niess
S. McCoy
J. Gelpey
F. Cnistiano
R. Duffr
S. Boninelli
O. Marcelot
P. Francesco
5 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
Title of ser.:
ECS transactions
Ser. no.:
3(2)
Pub. Year:
2006
Page(from):
77
Page(to):
84
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775021 [1566775027]
Language:
English
Call no.:
E23400/3-2
Type:
Conference Proceedings

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