Modeling Growth Behavior for Si₁₋xGex from SiH₄ and GeH₄ by CVD
- Author(s):
- Publication title:
- Silicon materials science and technology X
- Title of ser.:
- ECS transactions
- Ser. no.:
- 2(2)
- Pub. Year:
- 2006
- Page(from):
- 299
- Page(to):
- 312
- Pages:
- 14
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774390 [156677439X]
- Language:
- English
- Call no.:
- E23400/2-2
- Type:
- Conference Proceedings
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