Effect of the Substrate Heating Due to the Sputtering Process on the Ctystallinity of TiO2 Thin Films

Effect of the Substrate Heating Due to the Sputtering Process on the Ctystallinity of TiO2 Thin Films

Author(s):

H. Toku

A. S. da Silva Sobrinho

1 more

Publication title:

Microelectronics Technology and Devices : SBMICRO 2007

Title of ser.:

ECS transactions

Ser. no.:

9(1)

Pub. Year:

2007

Page(from):

189

Page(to):

198

Pages:

10

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775656 [1566775655]

Language:

English

Call no.:

E23400/9-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00047130
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on Microelectronics Technology and Devices : SBMicro
Conf. info. (Number):	22nd : 2007
Conf. info. (Venue):	Rio deJaneiro, Brazil
Conf. info. (Date):	2007.09.03-2007.09.06

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