Implementation of Atomic Layer Deposicion in Advanced Semiconductor Processes

Implementation of Atomic Layer Deposicion in Advanced Semiconductor Processes

Author(s):

M. Schaekers

Publication title:

Atomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA

Title of ser.:

ECS transactions

Ser. no.:

1(10)

Pub. Year:

2006

Page(from):

3

Page(to):

14

Pages:

12

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774437 [1566774438]

Language:

English

Call no.:

E23400/1-10

Type:

Conference Proceedings

Details

TDL ID:	ZA00047104
Series ID:	PA00000034
Conf. info. (Name):	ECS Meeting
Conf. info. (Number):	208th
Conf. info. (Venue):	Los Angeles, California, USA
Conf. info. (Date):	2005.10.16-2005.10.21

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