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Wet Etch Characteristics of Hafnium Silicate Layers

Author(s):
M. Claes
V. Paraschiv
D. Dictus
T. Conard
W. Boullari
S. Vanhaelemeersch
S. De Gendt
A. Delabie
S. Van Elshoclst
C. Zhao
J. Everaert
6 more
Publication title:
Physics and technology of high-k gate dielectrics III
Title of ser.:
ECS transactions
Ser. no.:
1(5)
Pub. Year:
2006
Page(from):
633
Page(to):
644
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774444 [1566774446]
Language:
English
Call no.:
E23400/1-5
Type:
Conference Proceedings

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