BENEFITS OF SINGLE WAFER POLYMER REMOVAL WITH INORGANIC CHEMICALS ON FEOL AND BEOL STRUCTURES OF DRAMS

BENEFITS OF SINGLE WAFER POLYMER REMOVAL WITH INORGANIC CHEMICALS ON FEOL AND BEOL STRUCTURES OF DRAMS

Author(s):

Publication title:

Cleaning Technology in Semiconductor Device Manufacturing IX

Title of ser.:

ECS transactions

Ser. no.:

1(3)

Pub. Year:

2006

Page(from):

180

Page(to):

186

Pages:

7

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

Language:

English

Call no.:

E23400/1-3

Type:

Conference Proceedings

Details

TDL ID:	ZA00047097
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
Conf. info. (Number):	9th ; 2005
Conf. info. (Venue):	Los Angeles, California, USA
Conf. info. (Date):	2005.10.00

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