Blank Cover Image

SINGLE-WAFER TOOL PERFORMS RE-CONTAMINATION FREE IN WET WAFER CLEANING

Author(s):
Publication title:
Cleaning Technology in Semiconductor Device Manufacturing IX
Title of ser.:
ECS transactions
Ser. no.:
1(3)
Pub. Year:
2006
Page(from):
150
Page(to):
157
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774291 [1566774292]
Language:
English
Call no.:
E23400/1-3
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings WAFER' S BACKSIDE CLEANING WITH A SINGLE-WAFER TOOL

Liu, LEWIS, BRAUSE, ERIC, KASHKOUSH, ISMAIL, WALTER, ALAN, NOVAK, RICHARD

Electrochemical Society
7 Conference Proceedings Laser Fizeau interferometer for silicon wafer site flatness testing

Novak,E., Olszak,A.G., Stumpe,K., Knowlden,R.E., Malevanchik,L., Angeli,G.Z.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Determination of Rinsing Parameters Using a Wafer Gap Conductivity Cell in Wet Cleaning Tools

Lindquist, P. G., Walters, R. N., Throngard, J. O., Rosato, J. J.

MRS - Materials Research Society
8 Conference Proceedings Gate Oxide Cleans on Single Wafer Tool

P. Garnier, T. Vessa, A.S. Larrea, B. Pernet, Y. Gomez

Electrochemical Society
3 Conference Proceedings In Situ Chemical Concentration Control for Wafer Wet Cleaning

Kashkoush, Ismail, Brause, Eric, Novak, Richard, Grant, Robert

MRS - Materials Research Society
9 Conference Proceedings MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER

Roman, P., Kashkoush, I., Novak, R.E., Kamieniecki, E., Ruzyllo, J.

Electrochemical Society
4 Conference Proceedings Surface Photovoltage Characterization of Heavy Metal Contamination and Wafer Cleaning Efficiency in Wet Chemical Processes

Rosato, J.J., Hall, R.M., Parry, T.B., Kelly, J.D., Butler, J.N., Jarvis, T.D., Lindquist, P.G.

Electrochemical Society
10 Conference Proceedings ETCH UNIFORMITY OF THERMAL OXIDE DURING HF-WET PROCESSES

Kashkoush, I., Novak, R.E., Rajaram, B., Carrillo, F.

Electrochemical Society
5 Conference Proceedings PARTICLE CONTAMINATION DURING WET CLEANING PROCESS ONTO VARIOUS WAFER SURFACES

Sakata, Yasuki, Ohnishi, Akihiro, Kishi, Gunji, Izumo, Shouzou, Kondou, Hiroyuki, Tomozawa, Akihiro

Electrochemical Society
11 Conference Proceedings NON-IPA WAFER DRYING TECHNOLOGY FOR SINGLE-SPIN WET CLEANING

Miya, K., Kishimoto, T., Izurni, A.

Electrochemical Society
6 Conference Proceedings Metal Contamination from Process Materials Used in Wet Cleaning of Silicon Wafer

D. Sinha

Electrochemical Society
12 Conference Proceedings SINGLE - WAFER WET CLEANING FOR A HIGH PARTICLE REMOVAL EFFICIENCY ON HYDROPHOBIC SURFACE

K. Sano, A. Izumi, A. Eitoku, J. Snow, E. Kesters, P. Mertens

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12