Spectroscopic and Topographic Investigations of Nanoparticle Abrasive Retention in Polyurethane CMP Pads for Cu CMP
- Author(s):
- Publication title:
- Advances and challenges in chemical mechanical planarization : symposium held April 10-12, 2007, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 991
- Pub. Year:
- 2007
- Page(from):
- 65
- Page(to):
- 70
- Pages:
- 6
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558999510 [1558999515]
- Language:
- English
- Call no.:
- M23500/991
- Type:
- Conference Proceedings
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