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Measurement of ultra low film stress, local stress distribution and flatness by imaging nanotopography based on low coherence phase shifting interferometry in conjunction with wafer and film thickness metrology

Author(s):
Publication title:
Advanced characterization techniques for optics, semiconductors, and nanotechnologies III : 28-29 August 2007, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6672
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819468208 [0819468207]
Language:
English
Call no.:
P63600/6672
Type:
Conference Proceedings

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