Characterization of AlF3 thin films in the ultraviolet by magnetron sputtering of aluminum target

Characterization of AlF3 thin films in the ultraviolet by magnetron sputtering of aluminum target

Author(s):

B.-H. Liao ( National Central Univ. (Taiwan) )
M.-C. Liu ( National Central Univ. (Taiwan) )
C.-C. Lee ( National Central Univ. (Taiwan) )

Publication title:

Nanoengineering : fabrication, properties, optics, and devices IV : 27-30 August 2007, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6645

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467935 [0819467936]

Language:

English

Call no.:

P63600/6645

Type:

Conference Proceedings

Details

TDL ID:	ZA00046941
Series ID:	PA00000029
Conf. info. (Name):	SPIE NanoScience and Engineering : Nanoengineering
Conf. info. (Number):	2007 : 4th
Conf. info. (Venue):	San Diego, California, USA
Conf. info. (Date):	2007.08.27-2007.08.30

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