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A novel etch method for TaBO/TaBN EUVL masks

Author(s):
  • B. Wu ( Applied Materials, Inc. (USA) )
  • A. Kumar ( Applied Materials, Inc. (USA) )
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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