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Robust approach to determine the optimized illumination condition using process window analysis

Author(s):
Y. -J. Chun ( Samsung Electronics Co., Ltd. (South Korea) )
S. -W. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
S. Lee ( Synopsys Korea Inc. (South Korea) )
Y. -M. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
S. Suh ( Samsung Electronics Co., Ltd. (South Korea) )
S. -J. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
H. -K. Cho ( Samsung Electronics Co., Ltd. (South Korea) )
H. -J. Park ( Synopsys Korea Inc. (South Korea) )
B. Falch ( Synopsys Korea Inc. (South Korea) )
4 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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