Extendibility of single mask exposure for practical ArF immersion lithography
- Author(s):
T. Adachi ( Dai Nippon Printing Co., Ltd. (Japan) ) Y. Inazuki ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Sutou ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Nagai ( Dai Nippon Printing Co., Ltd. (Japan) ) N. Toyama ( Dai Nippon Printing Co., Ltd. (Japan) ) Y. Morikawa ( Dai Nippon Printing Co., Ltd. (Japan) ) H. Mohri ( Dai Nippon Printing Co., Ltd. (Japan) ) N. Hayashi ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- Photomask and next-generation lithography mask technology XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6607
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819467454 [0819467456]
- Language:
- English
- Call no.:
- P63600/6607
- Type:
- Conference Proceedings
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