Efficient post-OPC lithography hotspot detection using a novel OPC correction and verification flow

Author(s):

• Q. Zhang ( Synopsys, Inc. (USA) )
• P. VanAdrichem ( Synopsys, Inc. (USA) )
• K. Lucas ( Synopsys, Inc. (USA) )

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings