Study of mask structure for 45-nm node based on manufacturability and lithographic performance
- Author(s):
J. G. Doh ( Samsung Electronics Co., Ltd. (South Korea) ) C. H. Park ( Samsung Electronics Co., Ltd. (South Korea) ) Y. S. Moon ( Samsung Electronics Co., Ltd. (South Korea) ) B. H. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) S. W. Kwon ( Samsung Electronics Co., Ltd. (South Korea) ) S. Y. Choi ( Samsung Electronics Co., Ltd. (South Korea) ) S. H. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) S. Y. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) B. G. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) S. G. Woo ( Samsung Electronics Co., Ltd. (South Korea) ) H. K. Cho ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Photomask and next-generation lithography mask technology XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6607
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819467454 [0819467456]
- Language:
- English
- Call no.:
- P63600/6607
- Type:
- Conference Proceedings
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