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Virtual lithography system to improve the productivity of high-mix low-volume production

Author(s):
K. Yoshida ( Toshiba Corp. Semiconductor Co. (Japan) )
T. Sato ( Toshiba Corp. Semiconductor Co. (Japan) )
T. Kono ( Toshiba Corp. Semiconductor Co. (Japan) )
E. Yamanaka ( Toshiba Corp. Semiconductor Co. (Japan) )
M. Kariya ( Toshiba Corp. Semiconductor Co. (Japan) )
A. Inoue ( Toshiba Corp. Semiconductor Co. (Japan) )
S. Mimotogi ( Toshiba Corp. Semiconductor Co. (Japan) )
2 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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