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Novel solution for in-die phase control under scanner equivalent optical settings for 45-nm node and below

Author(s):
S. Perlitz ( Carl Zeiss SMS GmbH (Germany) )
U. Buttgereit ( Carl Zeiss SMS GmbH (Germany) )
T. Scheruebl ( Carl Zeiss SMS GmbH (Germany) )
D. Seidel ( Carl Zeiss SMS GmbH (Germany) )
K. M. Lee ( Intel Mask Operation (USA) )
M. Tavassoli ( Intel Mask Operation (USA) )
1 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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